Stable charge storing in two-dimensional MoS2 nanoflake floating gates for multilevel organic flash memory.
نویسندگان
چکیده
In this study, we investigated chemically exfoliated two-dimensional (2-D) nanoflakes of molybdenum disulfide (MoS2) as charge-storing elements for use in organic multilevel memory devices (of the printed/flexible non-volatile type) based on organic field-effect transistors (OFETs) containing poly(3-hexylthiophene) (P3HT). The metallic MoS2 nanoflakes were exfoliated in 2-methoxyethanol by the lithium intercalation method and were deposited as nano-floating gates between polystyrene and poly(methyl methacrylate), used as bilayered gate dielectrics, by a simple spin-coating and low temperature (<150 °C) process. In the developed OFET memory devices, electrons could be trapped/detrapped in the MoS2 nano-floating gates by modulating the charge carrier density in the active channel through gate bias control. Optimal memory characteristics were achieved by controlling the thickness and concentration of few-layered MoS2 nanoflakes, and the best device showed reliable non-volatile memory properties: a sufficient memory window of ∼23 V, programming-reading-erasing cycling endurance of >10(2) times, and most importantly, quasi-permanent charge-storing characteristics, i.e., a very long retention time (longer than the technological requirement of commercial memory devices (>10 years)). In addition, we successfully developed multilevel memory cells (2 bits per cell) by controlling the gate bias magnitude.
منابع مشابه
Molecular and Quantum Dot Floating Gate Non - Volatile Memories
Conventional Flash memory devices face a scaling issue that will impede memory scaling beyond the 50nm node: a reliability issue involving the tunneling oxide thickness and charge retention. A possible solution is to replace the continuous floating gate, where charge is stored, with a segmented charge storage film, so that leakage through defects in the tunneling oxide would be localized. We fi...
متن کاملTwo-terminal floating-gate memory with van der Waals heterostructures for ultrahigh on/off ratio
Concepts of non-volatile memory to replace conventional flash memory have suffered from low material reliability and high off-state current, and the use of a thick, rigid blocking oxide layer in flash memory further restricts vertical scale-up. Here, we report a two-terminal floating gate memory, tunnelling random access memory fabricated by a monolayer MoS2/h-BN/monolayer graphene vertical sta...
متن کاملMolecules as segmented storage elements in Floating Gate Memories
Conventional flash memories may reach fundamental scaling limits [1] because of the minimum tunnel oxide thickness and poor charge retention due to defects in the tunneling oxide, necessitating new approaches to meet the scaling requirements while simultaneously meeting the reliability and performance requirements of future products. In this study we demonstrate alternative nano-segmented float...
متن کاملProspects for Si Semiconductor Devices and Manufacturing Technologies in Nanometer Era
OVERVIEW: Now with the availability of devices based on 65-nm node microfabrication technology, the miniaturization of silicon LSI further progresses into the nanometer range. There have been many proposals as to how the conventional constraints of legacy Si devices might be superceded. Considerable interest has focused on a device structure in which current channels are fabricated on a 3D subs...
متن کاملSynergistic High Charge-Storage Capacity for Multi-level Flexible Organic Flash Memory
Electret and organic floating-gate memories are next-generation flash storage mediums for printed organic complementary circuits. While each flash memory can be easily fabricated using solution processes on flexible plastic substrates, promising their potential for on-chip memory organization is limited by unreliable bit operation and high write loads. We here report that new architecture could...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید
ثبت ناماگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید
ورودعنوان ژورنال:
- Nanoscale
دوره 6 21 شماره
صفحات -
تاریخ انتشار 2014